HPQ3S/ BARATRON Gauge /1-100 amu /TH FIL, F-STYLE CHAMBER_1327018
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HPQ3S/ BARATRON Gauge /1-100 amu /TH FIL, F-STYLE CHAMBER

HPQ3S High Pressure RGA (<8mTorr)

High pressure compact quadrupole process monitors without differential pumping.

HPQ3S allows operation far beyond the 1e-4 mbar total pressure limit of other residual gas analyzers without the need for differential pumping. Field-proven technology coupled with the latest innovative electronics platform derived from the Microvision 2 family give data quality not previously seen in this class of instrument. The HPQ3S has a variety of software control options to match the requirements of any application.

For specific higher pressure applications up to 1e-2mbar the HPQ3S makes real-time corrections using a gauge pressure from the tool or by using a variety of optional independent gauges fitted to a custom F-Chamber designed for optimum performance.

Features & Benefits:

  • Easily installed
  • Web interface for setup and control on any network
  • High reliability & low cost

Applications:

The HPQ3 and HPQ3S are suitable for a wide range of applications in PVD or for vacuum systems with inert residual gases including:

  • Leak detection
  • Vacuum diagnostics
  • Pump down monitoring
  • Process monitoring
  • Rate-of rise testing

Software Leadership: In common with other MKS RGA products, the HPQ3 has a variety of software control options to match the requirements of all customer applications.

Built-in Web Server Application: A web interface using industry standard technology allows set-up and control of the HPQ3 from anywhere on a network. Using a non platform-specific web browser, calibration, operation and saving real time data to an export format is all possible. Using the documented Software Developer’s Kit, ASCII protocol and TCP-IP communication, any third party software can send and receive commands and data from the HPQ3 and HPQ3S.

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